Zirconium Dioxide ZrO2 Evaporation Materials

ZrO2 compounds in laboratory and industrial applications and steps for laboratory evaporative coating

Applications of Zirconium Dioxide (ZrO2) Compounds

Zirconium dioxide (ZrO2) is an important inorganic compound with a wide range of laboratory and industrial applications due to its excellent mechanical, thermal and optical properties.

Laboratory Applications:

Catalyst: ZrO2 is widely used as a catalyst or catalyst carrier in organic synthesis and petrochemicals.

Optical components: ZrO2 is used in the manufacture of high refractive index optical components, such as lenses and prisms, due to its high transparency and low absorption.

Sensors: ZrO2 nanoparticles are used in gas sensors with high sensitivity and selectivity2.

Industrial Applications:

Ceramic materials: ZrO2 is used in the manufacture of high-performance ceramics, which are widely used in cutting tools, bearings and nozzles due to their high strength, wear resistance and heat resistance.

Biomedical materials: ZrO2 is used in the manufacture of dental implants and artificial joints due to its excellent biocompatibility and mechanical properties.

Coating materials: ZrO2 is used in the manufacture of anti-reflective and protective coatings due to its high hardness and corrosion resistance.

Electronic devices: ZrO2 is used to manufacture capacitors and insulating layers due to its high dielectric constant and good electrical properties. 

Detailed steps for laboratory evaporative coating

Preparation:

Substrate cleaning:

Ultrasonic cleaning: Use ultrasonic cleaner to remove oil and particles from the surface of the substrate.

Solvent Cleaning: Use a suitable solvent (e.g. ethanol or acetone) to further clean the substrate surface.

CY Plasma Cleaning: Plasma cleaning is performed using CY plasma cleaning equipment. Plasma cleaning removes organic contaminants and oxidized layers from the surface of the substrate by generating high-energy plasma to improve the hydrophilicity and adhesion of the substrate surface. The specific steps are as follows:

Load the substrate: Place the substrate on the sample table of the CY plasma cleaning equipment.

Vacuum extraction: Start the vacuum pump to extract the air from the cleaning chamber to reach the required vacuum level.

Plasma Cleaning: Start the plasma generator, select the appropriate gas (such as oxygen or argon), adjust the power and time for plasma cleaning.

Cooling and Removal: After the cleaning is completed, turn off the plasma generator and remove the substrate after it has cooled down.

Vacuum extraction:

Vacuum Chamber: Place the substrate and coating material in the vacuum chamber, use mechanical and molecular pumps to extract the air from the chamber to achieve a high vacuum (usually below 10^-6 Torr).

Heating for evaporation:

Resistance heating:

Installation of resistor wire: a resistor wire (e.g., tungsten wire) is installed on the evaporation source and the coating material is placed on the wire.

Heating: Electricity is applied to heat the resistance wire to gradually increase its temperature until the coating material begins to evaporate. Resistance heating is suitable for the evaporation of low melting point materials.

Temperature control: The temperature of the resistance wire is precisely controlled by adjusting the current and voltage to ensure uniform evaporation of the coating material.

Electron beam heating:

Installation of coating material: Place the coating material in the crucible of the electron beam evaporation source.

E-beam Generator: Start the E-beam generator, the electron beam is focused and accelerated by an electromagnetic field to impact the surface of the coating material.

Heating and Evaporation: The high energy of the E-beam causes the coating material to rapidly heat up and evaporate. E-beam heating is suitable for evaporation of high melting point materials6.

Controlling the Electron Beam: By adjusting the power and scanning speed of the electron beam, the evaporation rate of the coated material is precisely controlled.

Deposition into film:

Evaporation Diffusion: The evaporated material diffuses in a vacuum and condenses to form a uniform film on the surface of the substrate. By adjusting the temperature and position of the substrate, the crystalline structure and adhesion of the film can be controlled.

Film Thickness Control: By monitoring the evaporation rate and time, the thickness of the film is precisely controlled using a quartz crystal monitor or an optical monitor. Thickness control is especially important for optical coatings and electronics manufacturing.

Cooling and Removal:

Cooling: Turn off the heaters and allow the substrate to cool to room temperature. Avoid contamination of the substrate surface during cooling.

Removal: Open the vacuum chamber and remove the coated substrate for subsequent processing or testing. The coated substrate is usually subjected to surface analysis and performance tests to ensure that the coating quality meets the requirements.

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