Titanium pentoxide Ti3O5 Evaporation Materials

Application of Ti3O5 compounds in laboratories and industries and the steps of laboratory evaporation coating

Application of titanium trioxide (Ti3O5) compounds

Ti3O5 is an important inorganic compound with a wide range of applications in laboratories and industries due to its unique physical and chemical properties.

Laboratory applications:

Data storage: The reversible phase change characteristics of Ti3O5 make it potentially applicable in the field of data storage. It can transform between different phases to achieve data writing and erasing.

Catalyst: Ti3O5 is widely used in organic synthesis and environmental catalysis as a catalyst or catalyst carrier. For example, it performs well in photocatalytic degradation of organic pollutants.

Trace detection: Ti3O5 materials show excellent performance in trace detection and can detect extremely low concentrations of target substances.

Industrial applications:

Microwave absorption: Ti3O5 materials perform well in the field of microwave absorption and are suitable for electromagnetic shielding and absorbing materials. It can effectively absorb and attenuate electromagnetic waves and protect electronic equipment from electromagnetic interference.

Virus adsorption: Ti3O5 materials show excellent performance in virus adsorption and have potential biomedical applications. For example, it can be used in air purifiers and masks to adsorb and inactivate viruses.

Optical coating: Ti3O5 is used to make high-refractive optical coatings due to its excellent optical transparency and low absorption. It can be used to make high-performance optical components such as lenses and filters.

Detailed steps for laboratory evaporation coating

Preparation:

Substrate cleaning:

Ultrasonic cleaning: Use an ultrasonic cleaner to remove oil and particles from the surface of the substrate.

Solvent cleaning: Use an appropriate solvent (such as ethanol or acetone) to further clean the surface of the substrate.

CY plasma cleaning: Use CY plasma cleaning equipment for plasma cleaning. Plasma cleaning removes organic pollutants and oxide layers on the surface of the substrate by generating high-energy plasma, and improves the hydrophilicity and adhesion of the substrate surface. The specific steps are as follows:

Loading the substrate: Place the substrate on the sample stage of the CY plasma cleaning equipment.

Vacuum extraction: Start the vacuum pump to extract the air in the cleaning chamber to achieve the required vacuum degree.

Plasma cleaning: Start the plasma generator, select the appropriate gas (such as oxygen or argon), adjust the power and time, and perform plasma cleaning.

Cooling and removal: After cleaning, turn off the plasma generator and remove the substrate after cooling.

Vacuum extraction:

Vacuum chamber: Place the substrate and coating material in the vacuum chamber, use mechanical pumps and molecular pumps to extract the air in the chamber to achieve a high vacuum state (usually below 10^-6 Torr).

Heating and evaporation:

Resistance heating:

Install the resistance wire: Install the resistance wire (such as tungsten wire) on the evaporation source, and place the coating material on the resistance wire.

Heating: Turn on the power to heat the resistance wire, so that its temperature gradually increases until the coating material begins to evaporate. Resistance heating is suitable for the evaporation of low melting point materials.

Temperature control: By adjusting the current and voltage, the temperature of the resistance wire is accurately controlled to ensure uniform evaporation of the coating material.

Electron beam heating:

Install the coating material: Place the coating material in the crucible of the electron beam evaporation source.

Electron beam generator: Start the electron beam generator, and the electron beam is focused and accelerated by the electromagnetic field to hit the surface of the coating material.

Heating and evaporation: The high energy of the electron beam causes the coating material to heat up and evaporate rapidly. Electron beam heating is suitable for evaporation of high melting point materials.

Controlling the electron beam: By adjusting the power and scanning speed of the electron beam, the evaporation rate of the coating material can be precisely controlled.

Deposition film:

Evaporation diffusion: The evaporated material diffuses in the vacuum and condenses on the surface of the substrate to form a uniform film. By adjusting the temperature and position of the substrate, the crystal structure and adhesion of the film can be controlled.

Film thickness control: By monitoring the evaporation rate and time, the thickness of the film can be precisely controlled using a quartz crystal monitor or an optical monitor. Film thickness control is particularly important for optical coating and electronic device manufacturing.

Cooling and removal:

Cooling: Turn off the heating device and wait for the substrate to cool to room temperature. Avoid contamination of the substrate surface during cooling.

Removal: Open the vacuum chamber and remove the coated substrate for subsequent processing or testing. The coated substrate usually requires surface analysis and performance testing to ensure that the coating quality meets the requirements.

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