MSDP Unipolar pulsed magnetron sputtering power supply

1. Significantly improve the charge accumulation phenomenon on the target surface, reduce the number of sparks on the sputtering surface, and improve the quality of the film layer.

2. It has the function of stabilizing the average power supply and has ideal voltage steep drop characteristics, which fully meets the continuity of the magnetron sputtering process.

3. No-load voltage ≥1000V, working voltage 200~800V.

4. Frequency 40kHz, duty cycle 20%~80%.

5. Manual control/analog interface control can be selected, and RS485 communication interface can be selected.

6. It adopts advanced PWM pulse width modulation technology and uses imported IGBT or MOSFET as power switching devices. It is small in size, light in weight, full in function, stable and reliable in performance, and has strict and perfect production process.

7. This series of products adopts advanced DSP control system to fully ensure the repeatability of the coating process, and has the function of suppressing target arc discharge and anti-short circuit.

8. It has excellent load matching ability, which not only ensures the stability of the target surface cleaning process, but also improves the target surface cleaning speed;

9. The main parameters can be adjusted continuously over a large range;

10. Convenient maintenance and high reliability;

11. PLC interface and RS485 interface expansion function, convenient for automatic control.

Main Applications:

Unipolar pulse magnetron sputtering is suitable for metal, alloy and graphite target materials to coat metal film, carbon film and some oxide, nitride and carbide films.

The lens must be pre-cleaned before coating. This cleaning requirement is very high, reaching the molecular level. Various cleaning liquids are placed in the cleaning tank, and ultrasonic waves are used to enhance the cleaning effect. After the lens is cleaned, it is placed in a vacuum chamber. During this process, special attention should be paid to avoid dust and garbage in the air from adhering to the surface of the lens. The final cleaning is carried out in the vacuum chamber. During this process, special attention should be paid to avoid dust and garbage in the air from adhering to the surface of the lens. The final cleaning is carried out in the vacuum chamber before coating. The ion gun placed in the vacuum chamber will bombard the surface of the lens (for example, with argon ions). After completing this cleaning process, the anti-reflection film will be coated. 

Purchase information:

If you are interested in our bias power supply, please contact us for more information.

Tel：138 3857 9492

Email：carol@cysitech.com

Contact：Carol Xu

Wechat：15290599353

WhatsApp/Skype: 13838579492

Main models and technical parameters: