300W RF Power Supply and matcher all-in-one machine

300W RF Power Supply and matcher all-in-one machine

300W RF Power Supply and matcher all-in-one machine Factory China

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The RF power supply and matcher all-in-one machine adopts the most stable and reliable power amplifier and DC module in current technology, so that the product provides extremely stable RF power output and is more durable.

The internal integrated matcher module adopts the most advanced digital network matching platform. The automatic matcher matches the complex impedance of the plasma with your desired tuning range in a fast, accurate and repeatable way. Compared with traditional analog tuning methods, digital tuning algorithms and stepper motor drives can produce faster, more accurate and highly repeatable responses, always keeping in line with the impedance point of the load.

The high quality and small quantity of components maximize the reliability of the product and the life cycle of the equipment. The LCD display has a comprehensive and intuitive operation menu, which can be used directly on the control panel of the equipment, providing unique ease of operation, improving operator efficiency and minimizing training costs.

Purchase information:

If you are interested in our RF power supply, please contact us for more information.

Tel：138 3857 9492

Email：carol@cysitech.com

Contact：Carol Xu

Wechat：15290599353

WhatsApp/Skype: 13838579492

Technical parameters:

Model	CY-RF300
Signal frequency	13.56MHz
Output power	5W-300W
Maximum reflected power	100W
Power stability	±0.1%
Harmonic component	≤-50dbc
Input power supply	Single-phase AC (187V-253V), frequency 50/60HZ
Efficiency	≥70%
Power factor	≥90%
Max. transmission power of matcher	500w
Reflected power (at max. power)	<3w
Maximum load current	30ARMS
Maximum load voltage	7500VRMS
RF output connector	50 Ω, L29,or customized
Match time	1~3s
Real part range of matchable impedance	0~80Ω
Imaginary part range of matchable impedance	﹣200j~ ﹢200j
Cooling method	Air cooling
Total weight	19.5kg
Dimension	133 mm (H)×440 mm (W)×410 mm (D)

Application:

In semiconductor process equipment, RF power is used to stimulate gas ionization in the chamber to generate plasma, supporting processes such as vacuum coating, plasma cleaning, and semiconductor etching.‌

In the LED and solar photovoltaic industries, RF power is used to generate plasma during the manufacturing process to promote material processing and product quality.‌

In scientific experiments, RF power is used to generate fixed-frequency sine waves to support plasma application research.‌

RF power is also widely used in RF induction heating and medical cosmetology for specific heating and treatment processes.‌

In atmospheric pressure plasma disinfection and cleaning, RF power is used to provide the necessary RF power to support the cleaning and disinfection process.