Three Source Thermal Evaporation Coater for Depositing Composite film

The thermal evaporation coater is a device used for depositing thin films on material surfaces. It is widely used in fields such as semiconductors, optical components, and electronic devices. The evaporation coating technology heats materials (usually metals) to sublime or evaporate them, and then condenses them into thin films on a cooled substrate surface. This method offers advantages such as fast deposition rate, dense films, and high purity.

Product Overview:

This equipment equipped with three sets of evaporation sources, using tungsten boat evaporation sources and water-cooled copper electrodes, with a maximum heating temperature of up to 1800℃. It can achieve the evaporation of various refractory metals, with three independent thermal evaporation sources that prevent cross-contamination. The equipment uses an integrated design with the chamber and electronic control parts separately positioned on the left and right, achieving a water-electricity separation that ensures user safety. The electronic control part combines a touch screen and button panel design, allowing auxiliary functions like vacuum systems and sample stage operations to be controlled with one-touch on the screen, while power evaporation and film thickness control are managed independently on the panel. This design enhances user convenience while minimizing the potential for operational errors. The equipment is well-designed with excellent performance and is essential for high-precision evaporation coating experiments in laboratories.

Product Features:

Efficient Coating: Uses thermal evaporation technology for high deposition rates and good film uniformity.

Multifunctional Application: Supports a variety of evaporation materials and substrates, suitable for depositing thin films on different materials.

Intelligent Control: Equipped with an advanced control system for precise control of process parameters.

Modular Design: Facilitates maintenance and upgrades, allowing customization of various functional modules as needed.

Environmentally Friendly: Low-energy design reduces environmental impact.

Purchase Information:

If you are interested in our evaporation coating instrument, please contact us for more information and a quote.

Phone: +86 18516380382

Email: Jimmy@cysitech.com

Contact Person: Jimmy Hao

WeChat: +86 18516380382

Technical Parameters:

 Main Components:

 Application Areas:

Semiconductor Manufacturing: For the preparation of functional films for integrated circuits and microelectronic devices.

Optoelectronic Technology: Suitable for film deposition on optoelectronic devices such as photovoltaic cells, LEDs, etc.

Display Technology: Widely used in LCD, OLED, and other display devices.

Surface Engineering: For surface modification and coating of metals, ceramics, plastics, etc.

Application Example: Depositing Magnesium Fluoride (MgF₂), Calcium Fluoride (CaF₂), and Aluminum (Al) Films by Using Evaporation Coating on Glass Substrates

Process Steps:

1. Substrate Preparation:

Cleaning: Use deionized water and detergent to clean the glass substrate, followed by ultrasonic cleaning to remove surface contaminants.

Drying: Blow dry with nitrogen or air dry in a clean environment to ensure the surface is free of moisture and particles.

2. Equipment Preparation:

Loading Substrate: Secure the cleaned glass substrate in the coating instrument's substrate holder, ensuring it is flat and stable.

Preparing Materials: Place high-purity magnesium fluoride, calcium fluoride, and aluminum materials on their respective evaporation sources.

3.Vacuum Environment:

Pumping: Start the vacuum pump to reduce the chamber pressure to 10⁻⁶ Torr or lower to prevent impurities.

4. Magnesium Fluoride (MgF₂) Deposition:

Heating Evaporation Source: Use resistive heating to sublime magnesium fluoride. Electron beam heating is often used for better temperature control.

Deposition Rate Control: Monitor the deposition rate using a quartz crystal monitor and adjust the heating power to achieve the desired film thickness.

Film Formation: Magnesium fluoride vapor condenses on the substrate surface to form a transparent anti-reflective MgF₂ film. 

5. Calcium Fluoride (CaF₂) Deposition:

Switch Evaporation Source: Change to the calcium fluoride evaporation source.

Heating Evaporation Source: Heat calcium fluoride to sublime it, usually using electron beam heating.

Deposition Rate Control: Continue using the quartz crystal monitor to control the deposition rate, ensuring a uniform CaF₂ layer.

Film Formation: Calcium fluoride vapor condenses on the MgF₂ layer, forming a highly transparent CaF₂ film.

6. Aluminum (Al) Deposition:

Switch Evaporation Source: Change to the aluminum evaporation source.

Heating Evaporation Source: Start the heating source to evaporate aluminum, typically using resistive heating.

Deposition Rate Control: Continue using the quartz crystal monitor to control the deposition rate, ensuring consistent aluminum film thickness.

Film Formation: Aluminum vapor condenses on the CaF₂ layer, forming a reflective aluminum film.

7. Post-Processing:

Cooling and Venting: Gradually cool the substrate under vacuum, then slowly introduce inert gas (such as nitrogen) to return to atmospheric pressure.

Unloading Substrate: Open the coating instrument and remove the glass substrate coated with MgF₂, CaF₂, and Al films.

8. Quality Inspection:

Film Thickness Measurement

Use a film thickness meter or ellipsometer to measure the thickness of each film layer to ensure it meets design requirements.

Optical Performance Testing

Check the optical performance of the films, including transmittance and reflectance, to ensure the expected optical effects are achieved.

Mechanical Performance Testing

Check the adhesion and wear resistance of the films to ensure their mechanical performance meets application standards.

Precautions:

Material Purity: Choose high-purity magnesium fluoride, calcium fluoride, and aluminum materials to reduce impurity impact on film performance.

Temperature Control: Maintain stable temperatures throughout the coating process to ensure film quality and uniformity.

Vacuum Environment Maintenance: Always maintain a good vacuum environment, regularly check vacuum system seals, and the efficiency of the vacuum pump.

Equipment Maintenance: Regularly clean evaporation sources and coating chambers to remove residues and prevent impurities from affecting deposition quality.

During the use of the thermal evaporation coater, common problems and precautions cover equipment operation, film quality, process control, and more. Here are some common issues and corresponding precautions:

Common Issues:

1. Poor Film Adhesion:

Possible Causes: Contaminated substrate surface, uneven temperature distribution.

Solutions: Ensure substrate cleanliness, improve substrate preheat uniformity.

2. Uneven Film Thickness:

Possible Causes: Incorrect position of evaporation source, uneven substrate rotation.

Solutions: Adjust the position of the evaporation source, check and adjust substrate rotation device.

3. Particles in Film:

Possible Causes: Particulate contamination in vacuum environment, insufficient target purity.

Solutions: Increase vacuum degree, use high-purity targets, regularly clean equipment.

4. Overheating of Evaporation Source:

Possible Causes: Excessive heating power or prolonged duration.

Solutions: Adjust heating power and time, ensure accurate temperature control.

5. Insufficient Vacuum Level of Equipment:

Possible Causes: Vacuum system leakage or decreased pump efficiency.

Solutions: Check vacuum seals, maintain and repair vacuum pump.

6. Film Cracking:

Possible Causes: Rapid cooling rate, mismatched thermal expansion coefficients of materials.

Solutions: Control cooling rate, select appropriate substrate and coating materials.

Precautions:

1. Substrate and Target Preparation:

Ensure the cleanliness and high purity of substrates and targets to reduce impurities and particles affecting film quality.

2.Equipment Operation:

Master equipment operation procedures, strictly follow safety protocols, and wear appropriate protective gear.

3. Process Parameter Control:

Accurately control evaporation temperature, deposition rate, and film thickness to achieve uniform and high-quality films.

4. Environmental Control:

Maintain the cleanliness and constant temperature and humidity of the laboratory to avoid external interference with the coating process.

5. Regular Maintenance:

Regularly check and maintain the vacuum system, electrical system, and mechanical components to ensure normal equipment operation.

6. Experiment Records:

Keep detailed records of each coating process's parameters and results for analysis and process optimization.

By focusing on these common issues and precautions, you can improve the reliability and quality of the evaporation coating process and reduce uncertainties in experiments.