Single Source Thermal Evaporation Coater for Depositing SiO2 Film

The evaporation coater is a device used for depositing thin films on material surfaces. It is widely used in fields such as semiconductors, optical components, and electronic devices. Evaporation coating technology involves heating materials (usually metals) to sublime or evaporate, then condensing them onto a cooled substrate surface to form a film. This method offers advantages such as high deposition rates, dense film layers, and high purity.

Evaporation Coater Product Overview:

This equipment is a high vacuum evaporation coating instrument with a single evaporation source, using a tungsten wire basket (or tungsten boat) as the evaporation source. The distance between the sample stage and the evaporation source is adjustable. The instrument can stably evaporate metals and certain organics. It uses a high vacuum stainless steel chamber with good sealing and vacuum performance. The chamber is equipped with an observation window, allowing the coating process to be seen. The molecular pump system achieves a maximum vacuum of 10E-3 Pa, effectively improving coating quality and meeting the vacuum environment required for most evaporation coating experiments.

Product Features:

Efficient Coating: Utilizes thermal evaporation technology, achieving high deposition rates and good film uniformity.

Versatile Applications: Supports various evaporation materials and substrates, suitable for thin film deposition of different materials.

Intelligent Control: Equipped with an advanced control system for precise control of process parameters.

Modular Design: Facilitates maintenance and upgrades, with customizable functional modules based on needs.

Environmentally Friendly: Low energy consumption design reduces environmental impact.

Purchase Information:
If you are interested in our evaporation coating instrument, please contact us for more information and quotes.
Phone: +86 18516380382
Email: Jimmy@cysitech.com
Contact Person: Jimmy Hao
WeChat: +86 18516380382

Evaporation Coater Technical Parameters:

Main Components:

 Application Areas:

Semiconductor Manufacturing: For the preparation of functional films for integrated circuits and microelectronic devices.

Optoelectronic Technology: Suitable for film deposition on optoelectronic devices such as photovoltaic cells, LEDs, etc.

Display Technology: Widely used in LCD, OLED, and other display devices.

Surface Engineering: For surface modification and coating of metals, ceramics, plastics, etc.

Application Case: Depositing SiO₂ Film on Glass Substrate by Using Evaporation Coating Method

Process Steps:

1. Substrate Preparation:

Cleaning: Thoroughly clean the glass substrate to remove dust, grease, and other contaminants, using deionized water, detergent, and ultrasonic cleaning.

Drying: Dry the substrate with nitrogen or in a dust-free environment to ensure the surface is free of moisture.

2. Equipment Preparation:

Loading Substrate: Secure the cleaned glass substrate in the substrate holder of the evaporation coating instrument.

Preparing Target: Place high-purity silicon dioxide particles or target material in the evaporation source (typically molybdenum boat or crucible).

3. Vacuum Environment:

Evacuation: Start the vacuum pump to lower the chamber pressure below 10⁻⁶ Torr to prevent air contaminants during deposition.

4. Evaporation Deposition:

Heating Evaporation Source: Heat the silicon dioxide using resistance heating.

Deposition Rate Control: Adjust heating power to control the evaporation rate of silicon dioxide, typically monitored and controlled in real time using a quartz crystal monitor.

5. Film Growth:

Deposition Layer Formation: Silicon dioxide vapor condenses on the glass substrate surface to form a thin film. Ensure uniform heating of the substrate surface for even film layers.

Film Thickness Control: Control the film thickness based on application needs, typically ranging from nanometers to micrometers.

6. Post-Processing:

Cooling and Venting: Cool the substrate while maintaining vacuum, then slowly introduce inert gas (such as nitrogen) to restore normal pressure.

Remove Substrate: Open the coating instrument and remove the glass substrate with the deposited silicon dioxide film.

7. Quality Inspection:

Thickness Measurement: Use a film thickness gauge or ellipsometer to measure the film thickness to ensure it meets expectations.

Optical and Mechanical Testing: Check the optical properties (such as transmittance, reflectance) and mechanical properties (such as adhesion) of the film layer.

8. Precautions:

Material Purity: Ensure high purity of silicon dioxide material to minimize impurities affecting film quality.

Temperature Control: Maintain stable temperatures for both the substrate and the coating environment throughout the process to ensure uniformity and adhesion.

Vacuum Maintenance: Continuously monitor vacuum levels to ensure no contaminants interfere with film deposition.

During the use of the thermal evaporation coater, common problems and precautions cover equipment operation, film quality, process control, and more. Here are some common issues and corresponding precautions:

Common Issues

1. Poor Film Adhesion:

Possible Causes: Contaminated substrate surface, uneven temperature distribution.

Solutions: Ensure substrate cleanliness, improve substrate preheat uniformity.

2. Uneven Film Thickness:

Possible Causes: Incorrect position of evaporation source, uneven substrate rotation.

Solutions: Adjust the position of the evaporation source, check and adjust substrate rotation device.

3. Particles in Film:

Possible Causes: Particulate contamination in vacuum environment, insufficient target purity.

Solutions: Increase vacuum degree, use high-purity targets, regularly clean equipment.

4. Overheating of Evaporation Source:

Possible Causes: Excessive heating power or prolonged duration.

Solutions: Adjust heating power and time, ensure accurate temperature control.

5. Insufficient Vacuum Level of Equipment:

Possible Causes: Vacuum system leakage or decreased pump efficiency.

Solutions: Check vacuum seals, maintain and repair vacuum pump.

6. Film Cracking:

Possible Causes: Rapid cooling rate, mismatched thermal expansion coefficients of materials.

Solutions: Control cooling rate, select appropriate substrate and coating materials.

Precautions:

1. Substrate and Target Preparation:

Ensure the cleanliness and high purity of substrates and targets to reduce impurities and particles affecting film quality.

2.Equipment Operation:

Master equipment operation procedures, strictly follow safety protocols, and wear appropriate protective gear.

3. Process Parameter Control:

Accurately control evaporation temperature, deposition rate, and film thickness to achieve uniform and high-quality films.

4. Environmental Control:

Maintain the cleanliness and constant temperature and humidity of the laboratory to avoid external interference with the coating process.

5.Regular Maintenance:

Regularly check and maintain the vacuum system, electrical system, and mechanical components to ensure normal equipment operation.

6.Experiment Records:

Keep detailed records of each coating process's parameters and results for analysis and process optimization.

By focusing on these common issues and precautions, you can improve the reliability and quality of the evaporation coating process and reduce uncertainties in experiments.