E-mail: cysi@cysi.wang
Ion Source Electron Beam Evaporation Coating System is designed for the preparation of various conductive films, semiconductor films, ferroelectric films, optical films, micro-nano device processing, and electron microscope sample pretreatment.It is particularly suitable for depositing various refractory metal materials on both hard substrates (e.g., glass, silicon) and flexible substrates (e.g., PDMS, PTFE, PI)
Ion Source Electron Beam Evaporation Coating System is designed for the preparation of various conductive films, semiconductor films, ferroelectric films, optical films, micro-nano device processing, and electron microscope sample pretreatment.It is particularly suitable for depositing various refractory metal materials on both hard substrates (e.g., glass, silicon) and flexible substrates (e.g., PDMS, PTFE, PI).
1.High Purity Film Deposition:
Material Purity: Operates in high vacuum to reduce contamination, ensuring high purity of deposited materials.
Precise Composition Control: Allows precise control of evaporation rates for high-quality alloy or compound films.
2.Excellent Film Quality:
High-Density Films: Ion source-assisted deposition improves film density, reduces defects, and enhances mechanical properties.
Good Adhesion: Ion beams enhance adhesion between films and substrates, increasing durability.
3.Accurate Thickness Control:
Real-Time Monitoring: Equipped with monitoring systems for real-time film thickness measurement, enabling precise control.
Nanometer Precision: Achieves nanometer-level thickness control for applications with strict requirements.
4.Diversity and Flexibility:
Multi-Material Handling: Capable of evaporating multiple materials in one device, suitable for complex multilayer films.
Flexible Configuration: Modular design allows configuration adjustments based on application needs.
5.Efficient Energy Utilization:
Fast Response: Electron beam heating offers quick response characteristics, improving production efficiency.
Energy-Saving Design: More efficient energy utilization compared to other heating methods.
6.Advanced Control System:
Automated Operation: Features advanced computer control for simplified operation and reduced human error.
Programmable Functionality: Allows programmable deposition parameters for complex process workflows.
Purchase information:
If you are interested in our e-beam evaporation coater, please contact us for more information and quotes.
Contact number: 156 3719 8390
Email: shirley@cysitech.com
Contact person: shirley
WeChat: 18736046549
Name | Ion Source Electron Beam Evaporation Coating System | |
Model | CY-EVP500-EB | |
Operation conditions | Ambient temperature | 5℃～40℃ |
Power supply | 380V | |
Power | ≤20KW | |
Water pressure | ≤2.5bar | |
Vacuum chamber | φ500×H500mm | |
Electron gun | E-type electron gun with a 6-pocket crucible | |
Ion source | Kaufman ion source | |
Sample stage | Sample size: ≤φ150mm, the sample can be rotated, and can also be raised and lowered to adjust the distance from the sample to the electron gun (the shape of the sample holder is designed according to user requirements), heating temperature ≤500℃ | |
System vacuum | Ultimate vacuum | Achieves ≤5×10^-5Pa after 12-24 hours of baking |
Exhaust rate | Vacuum degree ≤5x10-4Pa within about 40 minutes from the atmosphere | |
Vacuum system | Molecular pump + mechanical pump system, and bypass exhaust is set | |
Film Thickness Measurement | Crystal film thickness monitor with less than 6% non-uniformity | |
Cooling System | Water cooling system with pressure monitoring | |
Lighting | One neon lamp | |
Observation window | Diameter 100mm, with X-ray filter glass | |
Control System | Touch screen system | |
Dimension | 1000mm×800mm×1500mm | |
Gross weight | 350KG | |
Main parts:
Name | Description |
Main machine | Ion Source Electron Beam Evaporation Coating System |
Water chiller | 1. Equip the molecular pump, evaporation electrode, and electron gun with independent water inlet and outlet to ensure long-term stable operation of the equipment; 2. The total water inlet is equipped with a water temperature and water pressure detection device to detect the water temperature and water pressure status and perform abnormal alarms 3. The total water inlet and outlet use a standard waterway pagoda interface to connect the user's on-site water supply system |
Molecular pump unit | 1. Vacuuming: The molecular pump can quickly reduce the pressure in the vacuum chamber to achieve the required high vacuum state, which is an indispensable condition in the electron beam evaporation process. 2. Maintain vacuum stability: During the coating process, the molecular pump continues to operate to maintain a stable vacuum in the vacuum chamber to ensure the uniformity and quality of the coating. 3. Remove gas impurities: The molecular pump can effectively remove residual gas and steam in the vacuum chamber to prevent these impurities from affecting the purity and performance of the film. 4. Improve deposition rate and quality: Under high vacuum conditions, the evaporation rate of electron beam evaporation materials and the deposition rate of thin films can be improved, and the crystal quality and adhesion of the film will also be better. |
Electron gun and power supply | 1. E-type electron gun The 270° deflection angle of the electron gun ensures that the electron beam emission source material does not pollute the film layer; The bidirectional and fast electron beam scanning system and scanning circuit avoid the "pitting" problem of the target material; The precise water channel design ensures that the temperature rise of the electron gun is small and can work stably for a long time; The crucible station of the electron gun evaporation source is 6 holes; 2. Electron gun power supply: 10kW; 3. Electron gun baffle: pneumatic; |
Ion source | 1. Surface cleaning: Before coating, the ion source can be used to clean the substrate surface to remove any contaminants and oxide layers that may affect the adhesion of the film 2. Improve film adhesion: The ion source can enhance the adhesion between the coating material and the substrate by bombarding the substrate with ions during the coating process. 3. Improve film density and structure: The ion source can affect the growth process of the film, enhance the density and structural consistency of the film, and improve the mechanical properties and corrosion resistance of the film. 4. Adjust film stress: By changing the energy and dose of ion bombardment, the ion source can control the stress in the film to make it more suitable for specific applications. 5. Improve optical and electrical properties: The ion source can affect the microstructure of the film, thereby improving its optical and electrical properties, such as transmittance, reflectivity and resistivity. |
Random accessory | Related auxiliary tools, such as screws, nuts, clamps, oxygen-free copper gaskets, fluororubber seals, etc. |
User manual | One piece |
Application fields:
1. Optical coating:
Used to prepare high-precision optical films, such as anti-reflective films, high-reflective films, filters, etc.
Widely used in optical lenses, lasers and optical communication equipment.
2. Semiconductor manufacturing:
In the manufacture of integrated circuits and microelectronic devices, it is used to deposit insulating layers, conductive layers and doping layers.
Commonly used in wafer processing, photolithography masks and MEMS device manufacturing.
3. Solar cells:
Used to prepare transparent conductive oxide (TCO) layers and absorption layers in thin-film solar cells.
Improve the photoelectric conversion efficiency of solar cells.
4. Decorative coating:
Used for the preparation of decorative coatings, such as surface coatings for watches, glasses, jewelry, etc.
Provide excellent appearance and wear resistance.
5. Protective coating:
Used to prepare corrosion-resistant and wear-resistant protective coatings.
Applied to surface protection of aerospace, automotive and industrial equipment.
6. Biomedical field:
Used to manufacture biocompatible coatings, such as antibacterial coatings for implants and coatings in drug delivery systems.
Improve the performance and life of biomaterials.
7. Display technology:
Thin film preparation for liquid crystal display (LCD) and organic light-emitting diode (OLED) display screens.
Improve the brightness, contrast and durability of the display.
Application case (Cr, Ag, Au, Pt film coating on substrate)
1. Preparation:
Clean substrate: Make sure the substrate surface is clean and free of contamination. Solvent cleaning or plasma cleaning can be used to remove surface impurities and oxides.
Install substrate: Fix the cleaned substrate on the sample holder of the coating instrument to ensure that it is correctly positioned in the vacuum chamber.
2. Vacuum system:
Evacuate: Start the vacuum pump system to reduce the pressure in the vacuum chamber to the required vacuum degree, usually 10 −5Torr or lower, to reduce the influence of impurity gases.
3. Pre-evaporation:
Preheat the material: Before starting the formal evaporation, the electron beam evaporation source preheats the chromium material to remove moisture and volatile impurities on the surface of the material.
4. Evaporation coating:
Start the electron beam: Focus the electron beam on the chromium material to heat and evaporate it. The evaporation rate of chromium is controlled by adjusting the power of the electron beam.
Coating parameter setting: Set the evaporation rate and film thickness, monitor the coating process according to the process requirements, and use a quartz crystal monitor to measure the film thickness in real time.
Rotate the substrate: In order to obtain a uniform coating, the sample holder can be rotated to ensure that the evaporated chromium is evenly covered on the substrate.
5. Cooling and post-processing:
Cool the substrate: After the coating is completed, the temperature of the substrate is gradually reduced to avoid stress and cracking of the film layer caused by rapid cooling.
Pass inert gas: Sometimes inert gas such as argon can be passed to prevent the film layer from being oxidized during the cooling process.
6. Inspection and post-processing:
Inspect the film layer: Use a microscope or other analytical instrument to check the thickness and uniformity of the chrome layer.
Post-processing: If necessary, additional treatments such as heat treatment or plasma treatment can be performed to improve the adhesion and performance of the film layer.
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