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D type Cavity High vacuum evaporation coater for Au thin film depositionD type Cavity High vacuum evaporation coater for Au thin film depositionD type Cavity High vacuum evaporation coater for Au thin film depositionD type Cavity High vacuum evaporation coater for Au thin film depositionD type Cavity High vacuum evaporation coater for Au thin film deposition

D type Cavity High vacuum evaporation coater for Au thin film deposition

    This equipment is multi-source high vacuum evaporation coater, the equipment adopts the  front door vacuum chamber design, the chamber space is large, the expansibility is strong,  can meet the evaporation coating of multiple large size samples.

This equipment is multi-source high vacuum evaporation coater, the equipment adopts the  front door vacuum chamber design, the chamber space is large, the expansibility is strong,  can meet the evaporation coating of multiple large size samples. The chamber is equipped  with an upper sample table, which can select the clamping or cassette type sample mounting  parts according to the user's sample style. The sample table can be rotated, heated and lifted, all operations are integrated through the touch screen control. The vacuum pump group of  the equipment is a two -stage vacuum system, which is composed of a bipolar rotary vane  vacuum pump and a turbomolecular pump, which can provide a clean and oil-free high  vacuum environment for vacuum coating test. The vacuum system contains a complete  pneumatic valve system, the user can through the touch screen for one -click operation to  achieve vacuum extraction, without stopping to take lofting, complete shutdown and other  operations.


The evaporation source of the equipment is two groups, taking tungsten boat evaporation source, water-cooled  copper  electrode,  can  support  the  maximum  300A  large  current, heating temperature up to 1800℃, can achieve a variety of refractory metal evaporation. The equipment adopts  the  integrated  design,  the  cavity  and  the  electric  control  part  are separated  from  each other,  which  realizes  the  separation  of  water  and  electricity,  and effectively ensures the safety of users. The electronic control part uses the combination of touch screen and button panel design, vacuum system, sample table and other auxiliary functions through the touch screen  one -click operation,  electrification  evaporation,  film thickness control through the panel independent operation, as convenient as possible to the user while  avoiding  the  possibility  of  misoperation. The  device  has  perfect  design  and superior performance, and is an essential choice for high-precision evaporation coating test in the laboratory.

Contact us :

If you are interested in our high vacuum evaporation coating equipment, please contact us for more information and quotation.

Tel: 86 159 3625 3205

Email: zerlinda@zztainuo.com

Contact person: Zerlinda

WeChat: 86 159 3625 3205

 Specifications:

Product   name

High   vacuum evaporation coater

Product   number

CY-EVH500-III-HHH-SS

 Sample stage

Size  

φ150mm

 Temperature

500

Evaporation   source

Metal   sources: tungsten boat, tungsten blue available

Organic   source temperature range: RT-500, precise temperature control

Can   be configured according to customer requirements: single source, dual source,   triple source, multi-source, mixed source

Evaporation   power supply

Each   evaporation source can be equipped with an independent power supply; it can   be evaporated separately or simultaneously.

Vacuum   chamber

Size

φ500mmH700mm

Observation   Window

φφ100mm

Materials  

High   quality stainless steel

Door   opening method

Front   door

Film   thickness measurement

Crystal   film thickness measuring instrument (film thickness controller is also   optional)

Vacuum   system

Backing   pump

Bipolar   rotary vane pump, gas pumping speed 1.1L/S

Secondary   pump

Turbomolecular   pump, gas pumping speed 600L/S

Vacuum   measurement

Compound   vacuum gauge (ionization gauge + resistance gauge)

Ultimate   vacuum

5×10-4Pa

Control   System

CYKY   self-developed professional controller

Other   parameters

Voltage  

AC380V,50Hz

Dimensions

L1000mm   * W800mm * H1500mm

Power  

7KW

Weight

350kg

 

Main accessories

Project   name

Quantity

Vacuum   chamber

1   sets

Cooling   system

1   pcs

High   Vacuum molecular pump set

1   sets

Test   target

Copper   particles 50g

Random   Accessories

1   sets

Operation   Manual

1   pcs

  • Application

Metal and dielectric films

Manufacturing of thin film sensors

Optical components

Nano and microelectronics

 

Application case: Au thin film deposition using 3 source high vacuum evaporation coating machine

  •  Experimental materials and equipment

 

1. Equipment preparation

Vacuum chamber: Make sure the chamber is clean and free of contamination, and all surfaces are free of impurities.

Evaporation source: Use a high-purity gold evaporation source, usually gold wire or gold particles.

Substrate: Prepare the substrate to be coated (such as silicon wafer, glass, etc.), and clean and dry it before use.

Jig and sample stage: Check and adjust to ensure the accurate position of the sample during the evaporation process.

 

2. Substrate preparation

Cleaning the substrate to remove surface contaminants, commonly used methods include:

Acetone ultrasonic cleaning

Deionized water rinsing

Isopropyl alcohol rinsing

Nitrogen blowing dry

 

3. Vacuum system

Start the vacuum pump and gradually evacuate to a high vacuum state, usually 10-6Torr or lower.

Make sure there are no leaks in the vacuum system and observe the reading of the vacuum gauge to confirm that the system is stable.

 

4. Evaporation process

Heating: Gradually heat the evaporation source to start sublimation of gold. Control the heating rate to avoid evaporation too fast and cause uneven particle size.

Film thickness control: Use a quartz crystal monitor or other film thickness gauge to monitor the film thickness in real time. The commonly used evaporation rate is 0.1 - 1 nm/s.

Uniformity: Adjust the rotation or displacement of the sample to ensure uniform film thickness.

 

5. Cooling and sampling

After the evaporation is completed, gradually cool the evaporation source and chamber.

After the chamber temperature returns to room temperature, slowly vent to normal pressure and remove the substrate.

 

6. Post-processing and testing

Use a microscope or other test equipment (such as atomic force microscope, scanning electron microscope) to check the uniformity and quality of the film.

Perform electrical or optical performance tests on the film and adjust process parameters as needed.

 

Notes

Purity and material selection: Select high-purity gold source materials to avoid doping.

Vacuum: Ensure high vacuum during evaporation to reduce the influence of impurity gases.

Temperature control: Precisely control the temperature and heating rate to obtain the desired film properties.

 


Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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