Dual-target magnetron sputtering coater with RF&DC power supply CY-MSH300-II-RFDC-SS

Dual-target magnetron sputtering coater with RF&DC power supply CY-MSH300-II-RFDC-SS

Dual head magnetron sputtering coater equipment is a special laboratory coating instrument developed by our company. The magnetron sputtering coater equipment can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.

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Dual head magnetron sputtering coater equipment is a special laboratory coating instrument developed by our company. The magnetron sputtering coater equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.

Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time.

After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory.

Dual-target magnetron sputtering coater technical parameters:

Power supply		AC220V, 50Hz
Whole power		6KW
Ultimate vacuum		5x10-4Pa
Sample table parameters	Size	φ150mm
	Heat temp	500℃ max.
	Temp control	±1℃
	Rotation speed	1-20rpm adjustable
Magnetron sputtering head parameters	Quantity	Size:2 inches x2
	Cooling mode	Water cooled, flow 10L/min required
	Water chiller	10L/min Circulating water cooling
Vacuum chamber	Size	φ300mm x 340mm H
	Material	SUS
	Watch window	φ100mm
	Opening mode	open type, easy to replace target
Gas flow controller		One-channel,200sccm Ar;
Vacuum pump		A molecular pump system, pumping 600L/S
Quartz vibrating film thickness gauge		One set, resolution 0.10 angstrom
Sputter power source		DC power supply:500W, Suitable for preparing metal films RF power supply:500W, Suitable for preparing non - metallic films
Operating mode		All-in-one computer operation
Overall Dimensions		1090mm x 900mm x 1250mm
Total weight		350kg

magnetron sputtering coater video:

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