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Desktop type split magnetron sputtering coater with open cover for  metal filmDesktop type split magnetron sputtering coater with open cover for  metal filmDesktop type split magnetron sputtering coater with open cover for  metal filmDesktop type split magnetron sputtering coater with open cover for  metal film

Desktop type split magnetron sputtering coater with open cover for metal film

    Desktop type split magnetron sputtering coator, can be used for the preparation of metal film, in the field of electronics, optical field, special ceramic preparation and other fields have applications, especially laboratory SEM sample preparation, desktop type double target DC magnetron coator using rotary heating sample  table, can effectively improve the uniformity of film and film quality

Desktop type split magnetron sputtering coator, can be used for the preparation of metal film, in the field of electronics, optical field, special ceramic preparation and other fields have applications, especially laboratory SEM sample preparation, desktop type double target DC magnetron coator using rotary heating sample  table, can effectively improve the uniformity of film and film quality. 

Desktop open-cover split-type magnetron sputtering coator is used for the preparation of metal film, which is applied in the field of electronics, optics, special ceramic preparation and other fields, and can also be used for laboratory SEM sample preparation. 

Product Features: 

High efficiency coating: magnetron sputtering technology, high deposition rate, good film uniformity.

Multi-functional application: support a variety of targets and substrates, suitable for film deposition of different materials.

Intelligent control: Equipped with advanced control system to achieve accurate process parameter control.

Modular design: easy to maintain and upgrade, can be customized according to the needs of various functional modules.

Environmentally friendly: Low energy consumption design, reducing the impact on the environment.

 Buy Information: 

If you are interested in our magnetron sputtering coater, please contact us for more information and quotation. 

•     Contact number: +8615617875939

•     Email: gordon@zztainuo.com

•     Contact: Gordon Zhang

•     Wechat: 15617875939

•     WhatsApp: +8613592553141 

Technical parameters:

Parameter name

Parameter Description

Product name

Desktop type split magnetron sputtering coater with open top cover

 

 

Product Model

CY-MSZ210-I-1DC-SS

CY-MSZ210-III-3DC-SS

CY-MSZ210-I-1RF-SS

CY-MSZ210-III-2DC1RF-SS

CY-MSZ210-II-2DC-SS

CY-MSZ210-III-1DC2RF-SS

CY-MSZ210-II-1DC1RF-SS

CY-MSZ210-III-3RF-SS

CY-MSZ210-II-2RF-SS


 

Vacuum chamber

Chamber material

304 stainless steel welded, surface polishing treatment

Pick-and-  place mode

Front door to pick up and drop samples and targets


Observation window

100mm diameter vacuum window with magnetic baffle to prevent   contamination

 

 

 

 

 

Sample stand

Sample size

Flat samples with diameters ≤ 150mm are acceptable

Target base distance

The distance between the target and the

substrate sample table can be electrically adjusted

Rotation speed

Fixed type, no rotation

Rotary type, speed 0-30RPM

Heating temperature

Type A: RT-500 。 C

Type B: RT-800 。 C

Type C: RT-1000 。 C

 

 

 

 

 

 

 

Magnetized Target

 

Target gun type

Normal type, Angle adjustable (for non- magnetic materials)

Strong magnetic type, Angle adjustable (for magnetic materials)

 

Target size

Non-magnetic target, 2 inches in diameter, thickness ≦3mm

Magnetic target, diameter 2 inches, thickness ≦1.5mm

Sputtering power

Available: 500W/1000W optional

Sputtering method

Yes: DC sputtering/RF sputtering optional

Working vacuum

0.3 3 pa

Overall  dimensions

550*350*900mm

 Main parts: 

Part name

Part description

Equipment host

1 vacuum coating chamber

Water cooler

1 chiller

Molecular pump set

Molecular pump set and control system 1   set, bipolar rotary vane pump 1 set

Test target

2 inch test copper target 3 pieces

Spare parts

Air compressor, bellows, 1 set of   accessories required for connection and installation

User's manual

1 copy

Part names

Part description

Application area: 

1. Materials science research

Functional film preparation: The laboratory can prepare various films with special functions through this equipment, such as metal films, oxide films, nitride films, etc. These films have important application value in material science research, such as for studying the electrical, optical, magnetic and other properties of materials. Nanomaterials research: The desktop-type open-cover magnetron sputtering coater can also be used for the preparation and research of nanomaterials. By precisely controlling the coating parameters, thin films with nanoscale structure can be prepared, which provides strong support for the development of nanotechnology.

2. Electronics industry

Electronic components manufacturing: In the electronics industry, the equipment can  be used to prepare thin film electrodes and conductive films of electronic components. These thin film electrodes and conductive films have an important impact on the  performance and stability of electronic components.

IC Manufacturing: While the desktop device may not be used directly for large-scale IC production, in a laboratory setting it can be used for research and development of new IC manufacturing processes and materials.

3.In the optical field

Optical film preparation: desktop type open-cover magnetron sputtering coater has important applications in optical film preparation, such as the preparation of anti- reflection film, reflection film, polarization film and so on. These optical films are widely used in optical instruments, photographic equipment, lighting equipment and other fields, which can improve the performance and stability of optical components.

4. Research and teaching

Scientific research experiment: In the field of scientific research, the equipment is an important tool for laboratory research in materials science, chemistry, physics and other fields. It can help researchers explore new materials, new processes and new methods, and promote the progress of science and technology.

Teaching demonstration: Because of its compact structure and easy operation, the desktop type open-top magnetron sputtering coater is also very suitable for teaching demonstration. Through practical operation and observation, students can more intuitively understand the principle and application of coating technology, improve learning interest and practical ability.

5. Other areas

Biomedical: In the biomedical field, the device can be used to prepare thin film materials for biomedical devices such as biosensors and biochips. These thin film materials are of great significance for improving the performance and stability of biomedical devices. 

Decorative and protective: Although this is not their primary field of application, their potential applications in decorative and protective coatings can also be explored under laboratory conditions. 

Application Case "Adopted: Simultaneous gold plating and silver metal film thickness of 100nm on 75*25mm slide using a desktop type open-top dual DC magnetron sputtering coater" 

Gold plating and silver metal film on 75*25mm slide at the same time with a desktop open-cover double-target DC magnetron sputtering coater, and the thickness of the film reaches 100nm, the general steps are more complicated, and the specific operation may vary according to the equipment model and manufacturer. The following is an overview of the steps based on general principles and common operations:

 1. Preliminary preparation 

Equipment inspection:

Make sure that the desktop type open cover double target DC magnetron sputtering coator is in good working condition, check that the power supply, vacuum system, control system, etc., are running normally.

Check whether the target (gold and silver) is firmly installed and whether the surface of the target is clean and free of impurities.

Prepare a 75*25mm slide and make sure it is clean and free of oil. 

Chamber cleaning:

Clean the coating chamber to remove impurities and residues that may exist to ensure the coating quality. 

To load the sample:

Place the clean slide on the sample table inside the coating chamber, making sure it is properly positioned and securely secured. 

2. The coating process 

Vacuum extraction:

Close all inlet and outlet valves of the coating chamber, start the vacuum pump group (including mechanical pump and molecular pump), and vacuum the coating chamber. During the vacuuming process, observe the vacuum gauge reading until the degree of vacuum required for the coating is reached (generally less than 1.0×10-4Pa). 

To preheat the target and sample:

Preheat the target and sample as needed to remove gas and moisture adsorbed on the surface. 

To pass inert gas:

When the coating chamber reaches the required vacuum, an appropriate amount of inert gas (such as argon) is passed into the coating chamber to adjust the atmosphere and pressure in the body. 

Adjust the parameters:

According to the coating needs, adjust the output power of DC power supply, coating time, gas flow and other parameters. The adjustment of these parameters is particularly critical due to the need for simultaneous plating and silver, and the film thickness needs to reach 100nm. 

To begin coating:

Turn on the direct current power supply of the target so that the target is sputtered in the inert gas to produce metal atoms or ions. These atoms or ions are deposited on the surface of the slide under the action of an electric field to form a metal film.

Since it is a two-target system, the sputtering process of the gold and silver targets needs to be controlled separately to ensure that both metals can be deposited evenly and simultaneously on the slide. 

To monitor the film thickness:

If the coater is equipped with a film thickness meter assembly, the film thickness data can be monitored in real time to ensure that the coating thickness meets the requirements of 100nm.

3. Post-processing 

To turn off the coating system:

After the coating is completed, the DC power supply of the target is turned off first, and then the inert gas is stopped.

Close the vacuum pump group, open the air valve to break the vacuum, and open the chamber to take out the sample after the pressure in the coating chamber returns to normal. 

Sample treatment:

Remove the coated slide for necessary cleaning and drying treatment.

Tools such as a microscope can be used to check the coating quality, such as film layer uniformity, thickness, etc. 

Record and organize: 

Record the parameters and observations during the coating process for subsequent analysis and improvement.

It should be noted that because the coating process involves complex physical and chemical changes, and the operation details may differ between different equipment models and manufacturers, the equipment instructions and operating procedures should be strictly followed in actual operation. At the same time, the control of key parameters such as the thickness of the coating also needs to be realized with the help of professional testing equipment and means.


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  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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