Automatic program controlled cylindrical cavity magnetron sputtering coater for High Temperature Superconducting Films

Automatic program controlled cylindrical cavity magnetron sputtering coater for High Temperature Superconducting Films

The magnetron sputtering Coater Machine is an advanced physical vapor deposition (PVD) equipment widely used in fields such as semiconductors, optoelectronics, display technology, and surface engineering. The equipment uses magnetron sputtering technology, enhancing ionization efficiency through a magnetic field to achieve high-quality, uniform film deposition

Inquire Now Next Product

Product Features:

High-Efficiency Coating: Uses magnetron sputtering technology with a high deposition rate and good film uniformity.
Versatile Applications: Supports various targets and substrates, suitable for different materials' film deposition.
Intelligent Control: Equipped with an advanced control system for precise process parameter control.
Modular Design: Easy maintenance and upgrade, customizable with various functional modules as needed.
Environmentally Friendly: Low energy consumption design, reducing environmental impact.

Purchase Information:

For more information and quotations, please contact us:

Phone: 185 3800 8121
Email: Lily@cysitech.com
Contact Person: Zhao Xiaoli
Whatsapp: 8613849254500
WeChat: 15617818691

Technical Parameters:

Parameter Name	Parameter Description
Product Name	Automatic Cylindrical Magnetron Sputtering Coater Machine
Product Model	CY-MSH300-I-1DC-SS		CY-MSH300-III-3DC-SS
	CY-MSH300-I-1RF-SS		CY-MSH300-III-2DC1RF-SS
	CY-MSH300-II-2DC-SS		CY-MSH300-III-1DC2RF-SS
	CY-MSH300-II-1DC1RF-SS		CY-MSH300-III-3RF-SS
	CY-MSH300-II-2RF-SS
Vacuum Chamber	Chamber material	304 stainless steel welded, polished surface
	Sample Handling	Front-opening door for sample and target loading
	Observation Window	Diameter 100mm vacuum window with magnetic shield to prevent contamination
Sample stage	Sample Size	≤150mm diameter flat samples
	Target-Substrate Distance	Distance between target and substrate can be electrically adjusted
	Rotation Speed	Fixed, non-rotating
		Rotating type, speed 0-30 RPM
	Heating Temperature	Type A: RT-500℃
		Type B: RT-800℃
		Type C: RT-1000℃
Magnetron Target	Magnetron Target type	Ordinary type, adjustable angle (for non-magnetic materials)
		Strong magnetic type, adjustable angle (for magnetic materials)
	Target Size	Non-magnetic target, diameter 2 inches, thickness ≤3mm
		Magnetic target, diameter 2 inches, thickness ≤1.5mm
	Sputtering Power	500W/1000W (optional)
	Sputtering Method	DC/RF sputtering (optional)
	Working Vacuum	0.3-3Pa
Sputtering Gases	High purity argon, nitrogen, oxygen, and other inert gases (purity 99.99%)
Vacuum Measurement	Composite vacuum gauge, resistor gauge + ionization gauge, measuring range: 105-10⁻⁵Pa
Vacuum Pumping	Fore pump: gas pumping speed 16L/S	Vacuum Pumping

Main Components:

Component Name	Description
Main Equipment	Vacuum coating chamber
Water Chiller	Cooling unit for magnetron target gun and molecular pump set, ensuring stable and safe coating processes
Molecular Pump Set	Molecular pump set and control system, double-stage rotary vane pump
Test Target	Three 2-inch copper test targets
Accessories	Air compressor, bellows, and necessary connecting installation accessories

Application Fields:

Semiconductor Manufacturing: For functional film preparation in integrated circuits and microelectronic devices.

Optoelectronic Technology: Suitable for film deposition in optoelectronic devices such as photovoltaic cells and LEDs.

Display Technology: Widely used in LCDs, OLEDs, and other display devices.

Surface Engineering: For surface modification and coating of metals, ceramics, plastics, etc.

Application Cases:

High-Entropy Alloy Films:

Case: In a research project, researchers used tri-target magnetron sputtering technology to prepare FeCoNiCr high-entropy alloy films. The study found that these films exhibit excellent thermal stability and oxidation resistance at high temperatures, with potential applications in high-temperature structural materials.

Transparent Conductive Oxides:

Case: A university's materials science research team used tri-target magnetron sputtering technology to prepare In2O3-SnO2-ZnO composite transparent conductive films. These films showed high transparency and low resistivity, suitable for use in solar cells and OLED displays as transparent electrode materials.

Spintronics Materials:

Case: In a spintronics study, scientists used tri-target magnetron sputtering technology to prepare CoFeB films and fabricated spin valve structures on them. The results showed that the prepared spin valve devices exhibited good magnetoresistance effects, suitable for application in high-density magnetic storage devices.

High-Temperature Superconducting Films:

Case: A laboratory used tri-target magnetron sputtering technology to prepare YBa2Cu3O7 high-temperature superconducting films. By adjusting the proportions of each component and deposition parameters, researchers successfully achieved high-quality superconducting films for use in the development of superconducting magnets for MRI equipment.

Multilayer Optical Coatings:

Case: An optics company used tri-target magnetron sputtering technology to prepare TiO2-SiO2-ZrO2 multilayer optical coatings for optical filters. These coatings exhibited excellent optical properties, suitable for high-precision optical instruments and communication devices.

Photocatalytic Materials:

Case: An environmental research institution used tri-target magnetron sputtering technology to prepare TiO2-Nb2O5-WO3 photocatalytic films. The study showed that these composite films have high photocatalytic activity under UV light, suitable for degrading organic pollutants in water.

Lithium-Ion Battery Electrodes:

Case: In battery research, researchers used tri-target magnetron sputtering technology to prepare LiNiMn composite film electrodes. The results showed that this electrode material has high energy density and good cycling stability, with potential applications in next-generation high-performance lithium-ion batteries.

These application cases demonstrate the successful use of tri-target magnetron sputtering technology in various fields, proving its great potential and advantages in preparing multi-component and composite material films.